ATHENA_DIFFUSION : Diffusion Process Simulation

• andfex01.in : Boron Implant and Anneal
• andfex02.in : Oxidation Enhanced Diffusion of Boron
• andfex03.in : Damage Enhanced Diffusion of Arsenic
• andfex04.in : Transient Enhanced Diffusion using <311> Clusters
• andfex05.in : Phosphorus Pile-up During Oxidation
• andfex06.in : Stanford High Dose Model
• andfex07.in : Emitter Push Effect
• andfex08.in : Grain-based Polysilicon Diffusion Model
• andfex09.in : Arsenic Activation
• andfex10.in : Impurity Activation Models
• andfex11.in : Phosphorus Predeposition using POCl
• andfex12.in : Indium Implant and Anneal
• andfex13.in : {311}-Cluster RTA in a MOSFET
• andfex14.in : Transient Activation Model