ATHENA_OPTOLITH : Optical Lithography Simulation

• anopex01.in : Aerial Image Simulation
• anopex02.in : Arbitrary Source Shapes
• anopex03.in : Planar Lithography with Phase Shift Masks
• anopex04.in : Imaging Using an Annular Illuminator
• anopex05.in : Imaging Using Spatial Filtering Techniques
• anopex06.in : Aberrated Aerial Image
• anopex07.in : SHRINC from Circular Sources
• anopex08.in : Aerial Image of of Arbitrary Shaped Masks
• anopex09.in : Superposition of Multiple Images
• anopex10.in : SHRINC Source for 45 Degree Lines
• anopex11.in : Swing Curves for CD Variation with Resist Thickness
• anopex12.in : Use of AquaTAR for CD Variation with Resist Thickness
• anopex13.in : Demonstration of Multilayer Resists
• anopex14.in : Imaging of a Complex Mask using MaskViews
• anopex15.in : Aerial Image Calculation for Mask Pattern with Non-Manhattan Geometry
• anopex16.in : Interference Imaging Technique
• anopex17.in : Smile Plot Generation
• anopex18.in : Demonstration of Multiple Exposures
• anopex19.in : Non-planar Lithography
• anopex20.in : Resist Flow Model for Post-development Bake
• anopex21.in : Demonstration of BPM for Non-planar Lithography
• anopex22.in : Optimization of Phase Shift Mask
• anopex23.in : Contact Printing Simulation