corporate information
 
 

首页 >  EDA资源中心 >  发表论文

发表论文  

发表论文 - 掩膜布局, DRC, 和 LVS

The full text of most of these papers may be found at the IEEE website at www.ieee.org.

G. Vakanas, S. Munir, E.Tejnil, D. Bald, R. Nagpal "Lithography-based automation in the Design
of Program Defect Masks" Proc. SPIE Feb. 2004

     
  网站地图   © 1984 - 2008 SILVACO International.   注册商标  -  隐私声明